ELECTRO-OPTIC TECHNOLOGY
Design, Fabrication, Measurement, and Packaging.
More courses related to optical areas are listed below.
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DATES AND LOCATIONS |
March
7 and 8, 2016. March
6 and 7, 2017 |
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July
4 and 5, 2016. July
3 and 4, 2017 |
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September
19 and 20, 2016. September
18 and 19, 2017 |
ON-SITE TRAINING: For more information,
call at 216-849-2512.
Cost: $1,200.
Registration Contact: 216-849-2512
Course Description
Optoelectronic devices and systems, along
with electronics technology, have become essential in both our industrial and social
lives. Areas covered include all aspects of integrated optical circuit
development, including materials, fabrication techniques, design consideration,
component development, waveguide design and fabrication, and application
requirements. Understanding of the terminology and concepts of optical
waveguides and devices will be described. The fabrication of optical waveguides
with a complete discussion of the fabrication techniques, materials, and
state-of-the art results for both active and passive devices will be discussed.
Included is an easy-to-follow sequence of steps for designing and fabricating
optical devices including amplifier, splitter, tunable wavelength filter, star
coupler, modulator, micro-electro-mechanical system switching, etc. The concept
of operation, fabrication, evaluation, and performance of these devices will be
covered in detail. The aim of this course is to present to the participants the
valuable information necessary to understand comprehensively the design,
fabrication techniques, measurements, packaging, and system applications of
optoelectronic devices, in a concise and organized form so that participants
can grasp the essence of this emerging technology. Our primary focus have been
placed on reporting the accomplishments to date, and presenting the issues
requiring future development in each of the major areas presented in this
course.
This course is provided into
eight parts:
1.
Overview of
Lightwave.
2.
Waveguide Design
in Integrated Optical Circuits.
3.
Materials and
Microfabrication Techniques.
4.
Materials and
Fabrication Process of Optical Waveguides.
5.
Glass-Waveguides
on Integrated Optical Substrates.
6.
Fiber-to-Optical
Waveguide Coupling Techniques.
7.
Characteristics
and Measurement of Integrated Channel Waveguides.
8.
Integrated Optical
Devices For Variety of Applications.
Hung D. Nguyen, Ph.D.
Dr. Nguyen is a senior engineer for the Space
Communication Division of NASA Glenn Research Center at
Practicing scientists, engineers, managers,
marketing/sale personnel, or technicians who desire either an introduction or
overview/review of optical circuit engineering , concerned with the selection
and application of components, and with the design and evaluation of systems.
BACK
- Gain a broad understanding of almost all aspects
of optoelectronic technology.
- Be able to design and specify systems, to read
the technical literature with a practical understanding, and to understand
manufacturer's data sheets.
- Understand the design, characteristics, and
performances of a wide spectrum of integrated optical components.
- Gain an in-depth understanding of the factors
necessary for processing, design, and fabrication of integrated
optoelectronic devices.
- Develop a basis for further research and
development.
- BACK
Overview of lightwave
Electromagnetic Spectrum
Ray theory transmission
Refraction and reflection
Critical angle, numerical aperature, refractive index difference
Acceptance angle
Snell's law
Fresnel reflection
Reflection coefficient effect of TE and TM polarization
Brewster angle
Types of polarization states
- Linear, circular, and elliptical polarizations
Jones matrix representations for
- Linear, circular, and elliptical polarization
Field representations of polarization
Which applications require polarization
Polarizing optical systems
- Linear and rotator polarizer
- Wave retarder : Quarter-wave and half-wave retarder.
Coherent state
- Perfect and partial-perfect coherence.
- Coherent time
- Coherent length
Interference states
What optical systems require coherent states
- Irradiance of coherent and incoherent waves
Diffraction
- Single and multiple slits
Interference
In class exercise
Waveguide Design in Integrated Optical Circuits.
Background
Optical waveguide design
- Condition for light guided into waveguide film.
Types of planar waveguides
- Embedded thin-film structure
- Ridge structure
- Rib structure
- Bulged structure
- Strip-load structure
Slab (2-D) waveguide.
- Step-index type.
- Graded-index type.
Rectangular (3-D) waveguide
- Buried type.
- Ridge type.
- Dielectric loading type.
Metal loading type.
Wave-vector diagram
Wave equations of dielectric waveguides
- TE and TM modes.
Eigenvalue equation for solving effective index N.
Effective index value.
- Normalized frequency
- Normalized guided index
Modes in the thin film and rectangular waveguides
Dispersion in waveguides
Approach and method of designing variety of waveguides
Condition of guided and radiation modes
Analysis of effective refractive indices
Derivation of the wave equations for waveguide
Power per unit guided width, reduce factors
In class exercise
Materials and Microfabrication Techniques in Optical
Integrated Circuits.
Features of microfabrication process.
Substrate and metallization materials
Electrical insulation for metallic crossover or vertical layers
Pattern techniques.
- Photolithography : Resist coating, exposure, development, etching-away, and direct process.
- Electro-beam lithography : Types of electron-beam resists, electron-beam printing process, development, and direct process.
Process steps.
- Substrate.
- Wafer preparation.
- Deposition of film layer
- Spin coating
- Beam evaporation.
- Mask materials
- Data for pattern
- Ion-beam method.
- Laser beam method.
- Electron beam method.
- Mask films.
- Materials: Photoresist, Ti, Al,
glass, etc.
- Evaporation, RF sputtering, and spin coating.
- Development
- Etching process.
- Dry etching: Plasma, reactive ion, and ion beam techniques.
- Wet etching.
Pattern transfer processing techniques
- Lift-off processing
Concerns regarding chemical etching.
- Low rate of reproducibility.
- Etching isotropic.
Factors controlling the etching rate
Materials and Fabrication Techniques of Optical
Waveguides
Fabrication techniques of slab and channel waveguides.
Materials and fabrication process.
Selection and fabrication process.
Spin-dip-coating deposition
Chemical vapor deposition
Radio-frequency deposition
Thermal vapor deposition
Sputtering
Ion-exchanged process
Epitaxial growth process
Ion implanation
Polymerization
Thermal diffusion
Structures and fabrication of 3-D waveguides.
Photolithography techniques in optical waveguide.
- Buried type.
- Ridge type.
- Dielectric-film loaded type.
- Metal-film type.
- Introduction to materials and fabrication techniques
- Waveguide patterning process
- LiNbO3/LiTaO3 waveguides
-Thermal Ti-in-diffusion: crystal preparation and metal-film depsition.
- Ti-diffused waveguides and deposition of buffer coatings.
- Photon exchange waveguide.
- Epitaxial grown
- Liquid phase
- GaAs waveguides
- Epitaxial grown
- Reactive ion etching
- SiO2/Si waveguides.
- SiO2 characteristic.
- SiO2 buffer layer thickness.
- Fabrication process and type of etchings.
- Polymer thin film waveguides
- Fabrication methods and charateristics.
- Injection molding
- Wet chemical
- Projection printing
- Ultraviolet laser.
- Photobleach
- Reactive ion etching
- Organic and polymer materials.
- Polymer films in semiconductor process.
- Types of etching effect.
- Degree of planarization.
- Multichip module interlayer dielectric applications.
- Wet etching process.
- Dry etching process.
- Nonlinear optical polymer materials.
- Electro-optic coefficient in polyimide.
- Electric poling field process.
In-class exercise
Glass-Waveguides on Integrated Optical Substrates
(Part I)
Basic device geometry
- Substrate
- Buffer layer
- Channel guide core
- Coating layer.
Glass waveguide configurations.
- Buried type.
- Ridged and loaded types
Glass deposition
- Dopant material system
Deposition methods.
- Thermal oxidation and nitridation
- Chemical vapor deposition.
- Sputtering method.
- Plasma-enhanced chemical vapour deposition
- Flame hydrolysis deposition.
- Sol-gel deposition
Glass-Waveguides on Integrated Optical Substrates
(Part II)
Characteristics and optical properties of glass materials
- Barium silicate glass.
- Ta2O5 , SiO2 – Ta2O5 , Nb2O5 , ZnO ,and GeO2 .
Fabrication techniques for the production of silica-based waveguides.
Propagation loss in silica-on silicon waveguides
- Directly UV-written silica-on-silicon process
- Ion-exchanged process.
- Flame hydrolysis deposition process.
- Reactive ion etching.
Type of waveguides
- Er-doped glass film
- K+ - ion exchanged
- Ag+ - Na+ Ion exchanged
- Ge02 –doped silica
- TiO2 doped silica
- Sol-gel silica
Fiber-to-Optical waveguide coupling techniques
Methods of coupling fiber into waveguides.
Beam waveguide coupler
Prism coupling method
Tapered single-mode fiber
Micro-lens fiber
Integrated spot size converter
Up-tapered ridge waveguide
Characteristics and Measurement of integrated channel
waveguides.
Measurement of transmission losses in channel waveguides.
Modal field.
Spectral transmittance.
Transmission losses.
Prism-sliding and end-fire methods.
Scattering-detection method.
End-fire coupling to waveguides of different lengths.
Optical source for loss measurements.
Optical component loss measurement.
Scattering loss measurement.
Transmission loss for optical waveguide
Cut-back technique
Prism technique.
Wavelength measurement.
Spectral measurement.
Return loss measurement.
Back reflection.
Laser chirp measurement.
Modulation bandwidth measurement.
In-class exercise
Integrated Optical Devices for Variety of applications.
Concept for control of guided waves.
- Amplitude modulation.
- Phase modulation.
- Deflection.
- Diffraction.
- Switching.
- Mode conversion.
Physical phenomena used to control refractive index effects.
- Electrooptic control.
- Acoustooptic control
- Thermooptic control
- Nonlinear-optic control
Comparison of free space elements and integrated optical elements.
- Beam expander.
- Beam narrower.
- Beam modulator.
- Beam switching.
- Polarizer.
Types of waveguide structures on substrate.
- Straight, star, and y-branch waveguides.
- Branching waveguide structure.
- Y-combiner structure.
Reciprocity.
Basic operations of waveguide couplers.
Types of loss.
- Throughput , tap, isolation , insertion, directionality, and excess loss.
Types of waveguide couplers.
- Y-junction , splitter, merging couplers.
Types of fiber couplers.
- T coupler: Grin rod and beamsplitter lenses.
- Star coupler: Transmission and reflective star
- Directional coupler.
- Wavelength selectivity.
- Wavelength division multiplexer.
- Micro-optical coupler.
- Fiber coupler.
Passive waveguide devices.
Directional coupling waveguides.
Integrated optical N x N star coupler.
Introduction, design, fabrication, and experiments.
Types: 16 x 16, 64 x 64 , 144 x 144.
Insertion loss, splitting uniform, index difference, minimum radius of curvature.
High-silica planar lightwave circuit technology.
Flame hydrolysis deposition and reactive ion etching.
Integrated-optic power splitters and star couplers.
In-P-based 1x16 optical splitters
Design structure and fabrication process.
Fiber pigtailed packaging method.
Mutifunnel waveguide power splitters.
Slab, funnel-shaped, and output waveguides.
Design and fabrication process.
1x128 optical power splitter.
Silica-based material.
Design and fabrication methods
Optic N x N star couplers.
64 x 64 and 144 x 144 star couplers.
High-silica planar circuit technology.
Flame hydrolysis deposition and reactive ion etching.
SiO2 base layer, SiO2 - GeO2 core layer.
Design and experiments : Taper waveguides, aperture angle, curvature radius, taper angle and length.
Optical path bending devices
Facet-mirror
Refractive-effect grating
Reflective-effect grating
Active waveguide devices.
Wavelength Filters.
Interferometer wavelength filter.
Acoustooptic- tunable wavelength filter (AOTF).
Characteristics of ATOF.
Acoustic power requirement, tuning relation, fiber bandwidth.
Principle of operation.
Phase-matched TM/TE converter.
Fabrication process : Optical waveguide, optical polarizer, acoustic absorber , transducer electrode.
Polarization-independent ATOF.
Spectral response measurement.
Microring resonator optical channel dropping filters.
Design parameters, fabrication process, and responses.
Fabrication method of stacked waveguides.
Wavelength multiplexer and demultiplexer.
Fundamental , design, and experiments.
Arrayed waveguide N x N multiplexer.
Multiplexing and demultiplexing function.
Add/drop multilexing function.
N x N interconnection router.
Waveguide layout and operating principle.
Focusing, path length difference, focal spot displacement, frequency channel spacing,
Free spectral range, grating order, channel crosstalk, frequency response.
Radius of curvature and stress.
Waveguide router.
Waveguide etch and thin film deposition.
Fabrication of arrayed-waveguide grating multilexer.
Material: Silicon, InP, Polymers.
Type: 1 x 30, 1 x 78, 7 x 7, 11 x 11, 13 x 13, 15 x 15, and 64 x 64.
Comparison between published results of arrayed waveguide multiplexer.
Add/drop multiplexer.
Functional description of add/drop multiplexer.
Arrayed-waveguide NxN multiplexer functions as add/drop multiplexer
Experimental setup and results
Mach-Zehnder based photo-induced gratings
Thin film filters
Types of thin film filters: Bandpass, edge, grin-rod lens, multi-reflection, and fiber-end filters.
Coating and thin film materials.
Design techniques
Thin film filter depositions.
- Plasma ion assisted deposition.
- Electron beam deposition.
- Bias-sputtering process.
Test and measurement.
Measurement mechanical durability methods
- Adhesion, environmental, and abrasion resistance.
Optical modulators
Waveguide etch, facet coating, Titanium or nonlinear optical polymer waveguide
Deposition, Cr/Au metallization, and dielectric coatings.
Modulation of light: Direct and external modulation
Wavelength chirping
Polarization modulator
Absorption modulator
Amplitude modulator
Traveling wave modulator
Phase modulator
Phase-matched polarization modulator
Optical amplifier.
Principle of operation.
Semiconductor laser type amplifier
Erbium doped fiber amplifier.
Variable optical attenuator
Device configuration, fabrication procedure, and experimental results
MEMS actuator.
Thermooptic actuator.
Micromachine membrane thermooptic actuator.
Tunable actuator with an optical monitoring tap.
Optical switching devices.
Phase modulator integrated with polarizer
Thermooptic waveguide device.
Interferometric modulator/switch.
Branching waveguide switches.
Polarizers and mode splitters.
TE - TM mode converter.
TE/TM polarization splitter.
Photoelastic waveguide and polarizer
Components required for optical sensor
Types of optical sensors
Amplitude sensor
Phase sensor
Amplitude sensor
Variable fiber coupling
Back reflected light
Shutter structure
Microbending effect
Phase modulation
Rotational effect
Mach-Zehnder interferometer
Multimode effect
Position
Displacement
Temperature
Pressure
Displacement sensor using Michelson interferometer.
Evanescent field sensor.
Gyroscope on chip and substrate.
Electric field sensor.
In class exercise
ADJOURN
Vendor/Point
of Contact:
Customer Service.
216-849-2512
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TIME : 8:00 – 5:00 FEES : $1,200. 3-way of Payment: 1.Check payable to : Lightwave Technology Corp.
(Mail to: Lightwave Technology Corp., 2. Purchase order attached : # 3. Invoice my company: Attention : Seminar Location: To be announced. |
IN-HOUSE
SEMINAR INFORMATION
Date: 2 days
Time: 8:00 - 5:00
Maximum students per training
section: 20
Fees: $ 7,800. ( Fee includes travel
expense and class materials)
POLICY
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DEAD LINE REGISTRATION |
Registration by regular or electronic mail must be received at least 14
days before the first day of class (course date) |
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REFUND POLICY |
Full refund if class is cancelled. Otherwise, 20% refund less than 7 days
before the first day of class. No refund is granted the first day of class. |
Lightwave Technology Corp. reserves the right to cancel
class if there is inadequate enrollment.
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